Sensitive photoresists for high-speed two­-photon lithography - Nature Nanotechnology

Sensitive photoresists for high-speed two­-photon lithography – Nature Nanotechnology

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This is a summary of: Liu, T. et al. Ultrahigh-printing-speed photoresists for additive manufacturing. Nat. Nanotechnol. https://doi.org/10.1038/s41565-023-01517-w (2023).

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